College Park, Maryland June 6 - 10 , 2004 |
MP23: Effect of Molecular Architecture on the Pore Structure of Nanoporous Poly(methylsilsesquioxane) Thin Films
Z. Lin, R. M. Briber (Department of Materials Science and Engineering, University of Maryland), H. C. Kim, W. Volksen, R. D. Miller (IBM Almaden Research Center, 650 Harry Road, San Jose CA 95120-6099)
Thin films of poly(methylsilsesquioxane) (PMSSQ) containing nanoscopic pores are one of promising materials for ultra low dielectric constant interconnect material in next generation microchips. A viable route to nanoporous PMSSQ films is using the phase separation between matrix PMSSQ and organic polymers (porogen) with subsequent degradation of the porogen at high temperature. Previous studies show the pore size and morphology depend on the interaction between PMSSQ and porogen, molecular architecture and amount of porogen. In this study, we examine the effect of porogen molecular architecture on the phase behavior and final pore morphology of nanoporous PMSSQ using small angle neutron scattering (SANS), neutron reflectivity (NR) and transmission electron microscopy (TEM). A linear and a star shaped polymer were used as porogens. SANS experiments were performed as a function of temperature. TEM was used to confirm the pore morphologies. Depth profiles of pore distribution obtained by neutron NR will be also addressed.
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